Advanced Micro-Fabrication Equipment Inc. China engages in the research and development, manufacture, and sale of high-end semiconductor equipment and pan-semiconductor equipment in China. It offers capacitive plasma etching equipment that is used in the etching of dielectric materials such as silicon oxide, silicon nitride, and low dielectric coefficient film layers in integrated circuit manufacturing; inductive plasma etching equipment and deep silicon etching equipment, which is used in the etching of monocrystalline silicon, polycrystalline silicon, and various dielectric materials in integrated circuit manufacturing; and MOCVD equipment that is used in the etching of through holes and trenches, such as CMOS image sensors, MEMS chips, 2.5D chips, 3D chips, etc. The company also provides accessories and services to the downstream integrated circuit, LED epitaxial wafer, advanced packaging, MEMS, and other semiconductor product manufacturing companies. Advanced Micro-Fabrication Equipment Inc. China was founded in 2004 and is headquartered in Shanghai, the People’s Republic of China.